POSITIVE PHOTORESIST COMPOSITION AND POSITIVE PHOTORESIST DEVELOPING PROCESS

摘要

The present invention provides a positive photoresist composition and steps of a positive photoresist developing process. The positive photoresist composition comprises a polymer (A), a photoacid generator (B), a solvent, and an additive. The positive photoresist composition also comprises a photosensitizer (C) and a nitrogen-containing compound (D). Light energy with a wavelength of 365nm can be absorbed by the positive photoresist, and after excitation, electrons are transferred to the absorption-free photoacid generator at the wavelength of 365nm, so that the photoacid generator generates an acid. In addition, by using steps of the positive photoresist developing process provided in the present invention, an image can be formed on a substrate by using the photoresist. When the image is formed at the light irradiation of 365nm by using the photoresist composition provided in the present invention, the light sensitization speed is high, the resolution is high, and the roughness of a line edge is low.