首页> 外国专利> SPUTTERING TARGET, DEVICE FOR FASTENING A SPUTTERING TARGET, METHOD FOR RECOGNIZING THE RELEASE OF A SPUTTERING MATERIAL AND PRODUCTION METHOD

SPUTTERING TARGET, DEVICE FOR FASTENING A SPUTTERING TARGET, METHOD FOR RECOGNIZING THE RELEASE OF A SPUTTERING MATERIAL AND PRODUCTION METHOD

机译:溅射靶,用于散射靶的装置,用于识别溅射材料的释放的方法和生产方法

摘要

The invention relates to a sputtering target (1), in particular a round or angular planar target, having a support, in particular having a rear plate (8), and a sputtering material (9), wherein the support is connected to the sputtering material (9). According to the invention, at least the support has at least one hole (12, 12a) completely penetrating through the support, such that a release of the connection between the support and sputtering material (9) can be determined by means of the hole (12, 12a). The invention further relates to a device (2, 2a) for fastening a sputtering target and a method for recognizing the release of a sputtering material (9) from a support of a sputtering target (1) and a method 1 for producing a sputtering target (1).
机译:本发明涉及一种溅射靶(1),特别是圆形或有角的平面靶,其具有支撑件,特别是具有后板(8),以及溅射材料(9),其中,所述支撑件与溅射连接材料(9)。根据本发明,至少支撑件具有至少一个完全穿透支撑件的孔(12、12a),使得支撑件与溅射材料(9)之间的连接的释放可以通过该孔( 12、12a)。本发明还涉及一种用于固定溅射靶的装置(2、2a),用于识别溅射材料(9)从溅射靶(1)的支撑体上释放的方法以及一种用于制造溅射靶的方法1。 (1)。

著录项

  • 公开/公告号WO2015022166A1

    专利类型

  • 公开/公告日2015-02-19

    原文格式PDF

  • 申请/专利权人 HERAEUS MATERIALS TECHNOLOGY GMBH & CO. KG;

    申请/专利号WO2014EP65927

  • 发明设计人 SCHOLL THOMAS;

    申请日2014-07-24

  • 分类号H01J37/34;

  • 国家 WO

  • 入库时间 2022-08-21 15:08:16

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号