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SPUTTERING TARGET, DEVICE FOR FASTENING A SPUTTERING TARGET, METHOD FOR RECOGNIZING THE RELEASE OF A SPUTTERING MATERIAL AND PRODUCTION METHOD
SPUTTERING TARGET, DEVICE FOR FASTENING A SPUTTERING TARGET, METHOD FOR RECOGNIZING THE RELEASE OF A SPUTTERING MATERIAL AND PRODUCTION METHOD
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机译:溅射靶,用于散射靶的装置,用于识别溅射材料的释放的方法和生产方法
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摘要
The invention relates to a sputtering target (1), in particular a round or angular planar target, having a support, in particular having a rear plate (8), and a sputtering material (9), wherein the support is connected to the sputtering material (9). According to the invention, at least the support has at least one hole (12, 12a) completely penetrating through the support, such that a release of the connection between the support and sputtering material (9) can be determined by means of the hole (12, 12a). The invention further relates to a device (2, 2a) for fastening a sputtering target and a method for recognizing the release of a sputtering material (9) from a support of a sputtering target (1) and a method 1 for producing a sputtering target (1).
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