PROCESSING METHOD OF SPUTTERING TARGET, PROCESSING DEVICE OF SPUTTERING TARGET, SPUTTERING TARGET, AND PRODUCTION METHOD OF SPUTTERING TARGET PRODUCT

摘要

PROBLEM TO BE SOLVED: To provide a processing method of a sputtering target capable of achieving a sputtering target having little strain.SOLUTION: A processing method of a sputtering target has steps of: installing a sputtering surface or an opposite surface of the sputtering target on an anchor block, to thereby fix the sputtering target on the anchor block; and scraping the outer peripheral surface of the sputtering target by a scraping tool, while rotating the scraping tool in the circumferential direction on the outer peripheral surface of the sputtering target.SELECTED DRAWING: Figure 1