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ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK
ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK
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机译:活性光敏感或辐射敏感树脂组成,抗蚀剂膜,抗蚀剂涂覆的面膜毛坯,抗蚀剂图案形成方法和光掩模
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摘要
This active light sensitive or radiation sensitive resin composition contains (A) a polymer compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by specific general formula (I), and (B) a compound that generates an acid when irradiated with active light or radiation.
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