ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, RESIST-COATED MASK BLANK, METHOD FOR PRODUCING PHOTOMASK, PHOTOMASK, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE, EACH OF WHICH USES SAID ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE COMPOSITION

摘要

the present invention, (A) a compound generating an acid by irradiation of actinic ray or radiation, (P) compounds which are soluble in an alkaline developer increases by the action of an acid, and (N ) to [NA], [NB], and [NC] by the sense of an actinic ray or last radiation sensitive composition containing a compound of at least one member selected from the group consisting of, for very fine (for example, line width of 50nm or less) in the formation of the pattern, a high resolving power, excellent pattern profile and a lower line Weed's roughness (LWR) at the same time a sense of an actinic ray or last radiation sensitive composition, and using the resist film, a pattern forming method which can satisfy a high level , resist coating mask blank, provides method of producing a photomask, the photomask manufacturing method of the electronic device, and an electronic device. [N] A resin-to decrease solubility in an alkali developing solution by acid, or the action of actinic light radiation, or active species N-compounds [B] generating an acid by irradiation of actinic ray or radiation, and also decrease the solubility in an alkali developing solution by the action of an acid, an actinic ray or radiation, or active species Low molecular weight compounds that decrease the solubility in an alkali developing solution by the [N-C] acid, or the action of actinic light radiation, or active species