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SILICON CONTROLLED RECTIFIER FOR HIGH VOLTAGE APPLICATIONS

机译:适用于高压应用的硅控整流器

摘要

In a silicon controlled rectifier, an anode region includes p-type anode well regions laterally surrounded by an n-type well region. The length of a p-type anode well region measured in a first direction is larger than the width of the p-type anode well region measured in a second direction vertical to the first direction. The p-type anode well region meets with the n-type well region in a bonding part. The bonding part is extended in the second direction between the p-type anode well region and the n-type well region. A cathode region includes multiple n-type cathode well regions in a p-type well region. The length of the n-type cathode well region measured in the first direction is larger than the width of the n-type cathode well region measured in the second direction.;COPYRIGHT KIPO 2015
机译:在可控硅的整流器中,阳极区包括被n型阱区横向包围的p型阳极阱区。在第一方向上测量的p型阳极阱区域的长度大于在垂直于第一方向的第二方向上测量的p型阳极阱区域的宽度。在接合部分中,p型阳极阱区与n型阱区相遇。结合部分在第二方向上在p型阳极阱区域和n型阱区域之间延伸。阴极区在p型阱区中包括多个n型阴极阱区。在第一方向上测量的n型阴极阱区域的长度大于在第二方向上测量的n型阴极阱区域的宽度。; COPYRIGHT KIPO 2015

著录项

  • 公开/公告号KR20150016865A

    专利类型

  • 公开/公告日2015-02-13

    原文格式PDF

  • 申请/专利权人 TAIWAN SEMICONDUCTOR MANUFACTURING CO. LTD.;

    申请/专利号KR20130146502

  • 发明设计人 CHANG YI FENGTW;

    申请日2013-11-28

  • 分类号H01L29/86;H01L21/329;

  • 国家 KR

  • 入库时间 2022-08-21 15:00:45

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