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FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE PROCESS FOR PRODUCING STRIP FILM FOR SEMICONDUCTOR BACK SURFACE AND FLIP CHIP TYPE SEMICONDUCTOR DEVICE
FILM FOR FLIP CHIP TYPE SEMICONDUCTOR BACK SURFACE PROCESS FOR PRODUCING STRIP FILM FOR SEMICONDUCTOR BACK SURFACE AND FLIP CHIP TYPE SEMICONDUCTOR DEVICE
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机译:倒装片型半导体背表面的膜的生产方法倒装片型半导体背表面的膜和倒装片型半导体装置的膜
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摘要
PROBLEM TO BE SOLVED: To provide a film for a flip-chip type semiconductor back surface, which can keep high cutting precision thereof.;SOLUTION: The film 2 for a flip-chip type semiconductor back surface is formed on the back surface of a semiconductor element which is flip-chip connected on an adherend, wherein A/B lies within the range of 1-8×103 (%/GPa) when the elongation at 23°C of the film for the flip-chip type semiconductor back surface before thermosetting is A, and the tensile storage elastic modulus at 23°C of the film for the flip-chip type semiconductor back surface before thermosetting is B.;COPYRIGHT: (C)2012,JPO&INPIT
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