METHOD FOR PRODUCING AMPLITUDE diffractive optical elements and masks FOR MANUFACTURING PHASE STRUCTURES

摘要

A method of manufacturing diffractive optical elements of the amplitude and phase masks for fabrication of structures, comprising applying a metal film on the surface of the dielectric substrate, followed by exposure to a focused laser beam onto the film, characterized in that the molybdenum film thickness of 35-45 nm is applied, and the impact of the focused laser beam power is carried out (0.8-1.2) · 10W / cm, ensuring complete removal (ablation) of the metal film in the treatment area.