首页> 外国专利> PHASE GRATING MASK, METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE TYPE DIFFRACTION GRATING ELEMENT, AND OPTICAL WAVEGUIDE TYPE DIFFRACTION GRATING ELEMENT

PHASE GRATING MASK, METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE TYPE DIFFRACTION GRATING ELEMENT, AND OPTICAL WAVEGUIDE TYPE DIFFRACTION GRATING ELEMENT

机译:相位光栅面罩,光学波导型衍射光栅元件的制造方法以及光学波导型衍射光栅元件

摘要

PROBLEM TO BE SOLVED: To provide a method, etc., for manufacturing an optical waveguide type diffraction grating element having multiple reflection wavelengths at low cost and with good reproducibility.;SOLUTION: A phase grating mask 1 used for this manufacturing method has phase gratings formed respectively in N mutually isolated areas 11An (n=1 to 5) on a 1st surface 11 of a flat plate 10 made of quartz glass. On the 1st surface 11, the areas 11An (n=1 to 5) where the phase gratings are formed and flat areas 11Bn (n=0 to 5) where no phase grating is formed are present alternately in the (x)-axis direction. In the areas 11An (n=1 to 5), the thickness in the (z)-axis direction changes in a cycle of 2Lg along the (x) axis, thereby forming the phase gratings.;COPYRIGHT: (C)2002,JPO
机译:解决的问题:提供一种以低成本,高再现性制造具有多个反射波长的光波导型衍射光栅元件的方法等;解决方案:用于该制造方法的相位光栅掩模1具有相位光栅。在由石英玻璃制成的平板10的第一面11上的N个相互隔离的区域11An(n = 1〜5)中分别形成有N个。在第1面11上,在(x)轴方向上交替存在形成有相位光栅的区域11An(n = 1〜5)和没有形成相位光栅的平坦区域11Bn(n = 0〜5)。 。在区域11An(n = 1至5)中,(z)轴方向上的厚度沿(x)轴以2Lg的周期变化,从而形成相位光栅。;版权所有:(C)2002,JPO

著录项

  • 公开/公告号JP2002214455A

    专利类型

  • 公开/公告日2002-07-31

    原文格式PDF

  • 申请/专利权人 SUMITOMO ELECTRIC IND LTD;

    申请/专利号JP20010006651

  • 发明设计人 MURASHIMA KIYOTAKA;OMURA MAKI;

    申请日2001-01-15

  • 分类号G02B6/10;G02B5/18;G02B6/122;

  • 国家 JP

  • 入库时间 2022-08-22 00:55:56

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