FABRICATION OF AMPLITUDE DIFFRACTION OPTICAL ELEMENTS AND MASKS FOR PRODUCTION OF PHASE STRUCTURES

摘要

FIELD: physics, optics.SUBSTANCE: this process relates to optical instrument making, particularly, to production of diffraction optics and masks for making of phase structures. It includes application of molybdenum 35-45nm-deep film on dielectric substrate surface and subjecting it to focused laser radiation. Laser radiation density makes (0.8-1.2)·10W/cmto allows a complete removal (ablation) of metal film in the area of effects.EFFECT: decreased number of process jobs, shorter process cycle.2 dwg