首页> 外国专利> Phase mask consisting of an array of multiple diffractive elements for simultaneous accurate fabrication of large arrays of optical couplers and method for making same

Phase mask consisting of an array of multiple diffractive elements for simultaneous accurate fabrication of large arrays of optical couplers and method for making same

机译:由多个衍射元件组成的相位掩模,用于同时精确地制造大阵列的光耦合器及其制造方法

摘要

The present invention entails a phase mask for producing a plurality of volume gratings for use as optical couplers and method for creating the phase mask. The phase mask is produced by creating a plurality of volume gratings having predetermined characteristics which allow the phase mask, when excited by a coherent light wave, to produce a plurality of volume gratings in a recording material.
机译:本发明涉及一种用于制造用作光耦合器的多个体积光栅的相位掩模以及用于制造该相位掩模的方法。通过产生具有预定特性的多个体积光栅来产生相位掩模,所述多个体积光栅使相位掩模在被相干光波激发时能够在记录材料中产生多个体积光栅。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号