SYSTEM FOR COATING APPLICATION BASE OF INVERSE LITHOGRAPHY WITH SUBSTRATE HOLDER OPTIMISED IN DENSITY OF HIGH-INTENSITY INVERSE LITHOGRAPHY (HULA) IN CONICAL CHAMBER OF DEPOSITION

摘要

FIELD: process engineering.;SUBSTANCE: invention relates to deposition of material on substrate with application of inverse lithography process. Proposed device comprises conical housing with dome-like top, deposition source, central dome-like element arranged above deposition source and nearby dome-like top. Central dome-like element is arranged at first axis aligned with dome-like top to turn about central point. One or several orbital dome-shape elements are arranged above deposition source, nearby dome-like top, and at equal distance in radial direction of central point to turn about first axis and second axis at a time. Said second axis extends through central point of orbital dome-like element. Said orbital elements feature equal diameter and concavity as dome-like central element. Mask is arranged between deposition source and central dome-like element to engage with said central element. Central dome-like element and every orbital dome-like element comprise one or several substrate mounts arranged inside every orbital elements and central element to feed substrates inside.;EFFECT: higher quality.;19 cl, 7 dwg, 4 tbl, 2 ex