LIFT-OFF DEPOSITION SYSTEM FEATURING A DENSITY OPTIMIZED HULA SUBSTRATE HOLDER IN A CONICAL DEPOSITION CHAMBER

摘要

A VAPOR DEPOSITION DEVICE USING A LIFT-OFF PROCESS INCLUDES AN EVAPORATION SOURCE (40), A SPACE FRAME MOUNTED FOR ROTATION ABOUT A FIRST AXIS (200) THAT PASSES THROUGH THE EVAPORATION SOURCE (40), A CENTRAL DOME-SHAPED WAFER HOLDER MOUNTED TO THE SPACE FRAME WHEREIN A CENTERPOINT OF THE CENTRAL DOME-SHAPED WAFER HOLDER IS ALIGNED WITH THE FIRST AXIS (200), A ORBITAL DOME-SHAPED WAFER HOLDER MOUNTED TO THE SPACE FRAME IN A POSITION OFFSET FROM THE FIRST AXIS (200) AND ROTATABLE ABOUT A SECOND AXIS (210) THAT PASSES THROUGH A CENTERPOINT OF THE ORBITAL DOME-SHAPED WAFER HOLDER AND THE EVAPORATION SOURCE (40), AND A PLURALITY OF WAFER POSITIONS (140) ON THE CENTRAL DOME-SHAPED WAFER HOLDER AND THE ORBITAL DOME-SHAPED WAFER HOLDER WHERE EACH OF THE WAFER POSITIONS (140) ARE OFFSET FROM THE FIRST AXIS (200) AND THE SECOND AXIS (210). EACH OF THE PLURALITY OF WAFER POSITIONS (140) ARE CONFIGURED TO ORIENT A SUBSTRATE SURFACE OF A WAFER MOUNTED THEREIN SUBSTANTIALLY ORTHOGONAL TO A RADIAL AXIS EXTENDING FROM THE WAFER POSITION (140) TO THE EVAPORATION SOURCE (40) DURING ROTATION ABOUT THE FIRST AXIS (200) AND THE SECOND AXIS (210).