Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China;
Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China;
Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China;
Key Laboratory of Photoelectronic Imaging Technology and System of Ministry of Education of China School of Optics and Photonics Beijing Institute of Technology Beijing 100081 China;
Department of Electrical and Computer Engineering University of Delaware Newark DE 19716 USA;
Computational lithography; inverse lithography technology(ILT); optical proximity correction(OPC); deep learning;