Tlxsi1 - xn layers and their preparation

摘要

The present invention relates to a workpiece with coating which coating of at least a ti_xSi_{1 - x}N layer comprises, characterized in that x ≦ 0.85 and the ti_xSi_{1 - x}N layer contains nanocrystals, and the resulting nanocrystals an average particle size of not more than 15 nm and a (200) texture. The invention also relates to a method for the manufacture of the aforementioned layer, characterized in that for the preparation of a sputtering process in which it is used on the target surface of the sputtering targets to current densities of greater than 0.2 a / cm2, and the target a tixsi1 - x - target, wherein x ≦ 0.85.