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A substrate for electronic lithography has a high resolution and advantages of the lithography corresponding
A substrate for electronic lithography has a high resolution and advantages of the lithography corresponding
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机译:用于电子光刻的基板具有高分辨率和与之对应的光刻的优点
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摘要
In the field of very high-energy (50 keV or more) electron-beam lithography, a layer to be patterned by lithography is borne by a holding structure that comprises a substrate (for example made of silicon) and an intermediate layer made of a porous material of density lower than that of the same but non-porous material, this material, notably silicon or carbon nanotubes, having a low atomic number, lower than 32 and preferably lower than 20. This structure decreases the influence of backscattered electrons on high-resolution lithographic patterns.
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