首页> 外国专利> SILICON ON INSULATOR STRUCTURES HAVING HIGH RESISTIVITY REGIONS IN THE HANDLE WAFER AND METHODS FOR PRODUCING SUCH STRUCTURES

SILICON ON INSULATOR STRUCTURES HAVING HIGH RESISTIVITY REGIONS IN THE HANDLE WAFER AND METHODS FOR PRODUCING SUCH STRUCTURES

机译:手柄晶片中具有高电阻率区域的绝缘体结构上的硅及其制造方法

摘要

Silicon on insulator structures having a high resistivity region in the handle wafer of the silicon on insulator structure are disclosed. Methods for producing such silicon on insulator structures are also provided. Exemplary methods involve creating a non-uniform thermal donor profile and/or modifying the dopant profile of the handle wafer to create a new resistivity profile in the handle wafer. Methods may involve one or more SOI manufacturing steps or electronic device (e.g., RF device) manufacturing steps.
机译:公开了在绝缘体上硅结构的处理晶片中具有高电阻率区域的绝缘体上硅结构。还提供了用于在绝缘体结构上生产这种硅的方法。示例性方法涉及创建不均匀的热施主轮廓和/或修改处理晶片的掺杂剂轮廓以在处理晶片中创建新的电阻率轮廓。方法可能涉及一个或多个SOI制造步骤或电子设备(例如RF设备)制造步骤。

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