PROCESS FOR OBTAINING PATTERNED METAL-OXIDE THIN FILMS DEPOSITED ONTO A SUBSTRATE, FILMED SUBSTRATES OBTAINED THEREOF, AND SEMICONDUCTOR NANODEVICES COMPRISING THEM

摘要

A process for obtaining patterned metal-oxide thin films deposited onto substrates is provided, as well as filmed substrates obtained thereof, and semiconductor devices comprising them. The process comprises the steps of:;- preparing a metal oxide chelate solution by complexing metal oxide precursors with a ligand in an alcoholic solvent, wherein the ligand is methacrylic acid, for obtaining a metal oxide chelate;;- preparing a metal oxo-cluster solution by submitting the metal oxide chelate solution to water hydrolysis, for obtaining a partially-condensed metal oxide chelate;;- preparing a doped-metal oxide solution by doping the metal oxo-cluster solution with a doping material comprising a metal element;;- depositing the doped-metal oxide solution onto a substrate, for obtaining a substrate coated with a metal oxide thin film;;- patterning the coated substrate by irradiating it with deep ultra-violet (DUV) wavelengths, for obtaining a patterned coating;;- immersing the substrat comprising a patterned coating into a development media, for obtaining a developed patterned substrate;;- post-annealing the developed patterned substrate, for obtaining a fully inorganic patterned substrate.;The present invention belongs to the field of semiconductor nanodevices.