PROCESS FOR OBTAINING SEMICONDUCTOR NANODEVICES WITH PATTERNED METAL-OXIDE THIN FILMS DEPOSITED ONTO A SUBSTRATE, AND SEMICONDUCTOR NANODEVICES THEREOF

摘要

Processes for obtaining a semiconductor nanodevice comprising a substrate, onto which patterned metal-oxide thin films having semiconductor properties are deposited, are provided, as well as semiconductor devices comprising them. The present invention belongs to the field of semiconductor nanodevices.