首页>
外国专利>
Defect correction method for nanoimprint lithography template, and method for producing a nano-imprint lithography template
Defect correction method for nanoimprint lithography template, and method for producing a nano-imprint lithography template
展开▼
机译:纳米压印光刻模板的缺陷校正方法和制备纳米压印光刻模板的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
PROBLEM TO BE SOLVED: To provide a defect correction method of a template for nanoimprint lithography capable of easily correcting both residue defect and deficiency defect, and to provide a method of manufacturing a template for nanoimprint lithography.;SOLUTION: A hard mask pattern is formed by transferring a transfer pattern of a first template to a hard mask layer formed on a substrate constituting a second template, by using a first template having well-known defect position information. Defect of the hard mask pattern is corrected based on the defect position information of a transfer pattern of the first template, and then a transfer pattern of the second template is formed using the hard mask pattern subjected to defect correction as an etching mask.;COPYRIGHT: (C)2014,JPO&INPIT
展开▼