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Multi-Voltage Complementary Metal Oxide Semiconductor Integrated Circuits Based On Always-On N-Well Architecture

机译:基于永远在线N井架构的多电压互补金属氧化物半导体集成电路

摘要

Examples of multi-voltage (MV) complementary metal oxide semiconductor (CMOS) integrated circuits (ICs) based on always-on N-well architecture are described. A MV CMOS IC may include first CMOS cells, second CMOS cells, N-wells and always-on taps. Each first CMOS cell may have a supply terminal configured to receive a local supply voltage, and an N-well (NW) terminal configured to receive a global supply voltage. The second CMOS cells may include always-on CMOS cells. Each second CMOS cell may have a supply terminal configured to receive the global supply voltage, and an NW terminal configured to receive the global supply voltage. The NW terminal of at least one of the second CMOS cells and the NW terminal of at least one of the first CMOS cells may be formed in a first N-well of the one or more N-wells.
机译:描述了基于始终在线N阱架构的多电压(MV)互补金属氧化物半导体(CMOS)集成电路(IC)的示例。 MV CMOS IC可以包括第一CMOS单元,第二CMOS单元,N阱和常开抽头。每个第一CMOS单元可以具有被配置为接收局部电源电压的电源端子和被配置为接收全局电源电压的N阱(NW)端子。第二CMOS单元可以包括永远在线的CMOS单元。每个第二CMOS单元可以具有被配置为接收全局电源电压的电源端子和被配置为接收全局电源电压的NW端子。第二CMOS单元中的至少一个的NW端子和第一CMOS单元中的至少一个的NW端子可以形成在一个或多个N阱的第一N阱中。

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