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POWER MOSFET DEVICE STRUCTURE FOR HIGH FREQUENCY APPLICATIONS

机译:高频应用的功率MOSFET器件结构

摘要

This invention discloses a new switching device supported on a semiconductor that includes a drain disposed on a first surface and a source region disposed near a second surface of said semiconductor opposite the first surface. The switching device further includes an insulated gate electrode disposed on top of the second surface for controlling a source to drain current. The switching device further includes a source electrode interposed into the insulated gate electrode for substantially preventing a coupling of an electrical field between the gate electrode and an epitaxial region underneath the insulated gate electrode. The source electrode further covers and extends over the insulated gate for covering an area on the second surface of the semiconductor to contact the source region. The semiconductor substrate further includes an epitaxial layer disposed above and having a different dopant concentration than the drain region. The insulated gate electrode further includes an insulation layer for insulating the gate electrode from the source electrode wherein the insulation layer having a thickness depending on a Vgsmax rating of the vertical power device.
机译:本发明公开了一种新的支撑在半导体上的开关器件,其包括设置在第一表面上的漏极和设置在所述半导体的与第一表面相对的第二表面附近的源极区。开关装置还包括设置在第二表面的顶部上的绝缘栅电极,用于控制源极以汲取电流。开关装置还包括插入绝缘栅电极中的源电极,用于基本上防止栅电极和绝缘栅电极下方的外延区之间的电场耦合。源电极进一步覆盖并在绝缘栅上延伸,以覆盖半导体第二表面上的与源区接触的区域。半导体衬底还包括外延层,该外延层设置在漏极区上方并且具有与漏极区不同的掺杂剂浓度。绝缘栅电极还包括用于使栅电极与源电极绝缘的绝缘层,其中,绝缘层的厚度取决于垂直功率器件的Vgsmax额定值。

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