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Run-to-run control utilizing virtual metrology in semiconductor manufacturing
Run-to-run control utilizing virtual metrology in semiconductor manufacturing
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机译:在半导体制造中利用虚拟计量进行批量控制
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摘要
An apparatus for performing run-to-run control and sampling optimization in a semiconductor manufacturing process includes at least one control module. The control module is operative: to determine a process output and corresponding metrology error associated with an actual metrology for a current processing run in the semiconductor manufacturing process; to determine a predicted process output and corresponding prediction error associated with a virtual metrology for the current processing run; and to control at least one parameter corresponding to a subsequent processing run as a function of the metrology error and the prediction error.
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