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Method for chemical mechanical polishing of high-K metal gate structures
Method for chemical mechanical polishing of high-K metal gate structures
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机译:高k金属栅结构的化学机械抛光方法
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摘要
A method for manufacturing a semiconductor device includes providing a substrate, a dielectric layer on the substrate, a first hard mask layer on the substrate, and a second hard mask layer on the first hard mask layer. The method also includes removing the first hard mask layer using a reactive gas that does not cause damage to the dielectric layer to improve the performance and yield of the semiconductor device.
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