首页>
外国专利>
Metrology marks for bidirectional grating superposition patterning processes
Metrology marks for bidirectional grating superposition patterning processes
展开▼
机译:双向光栅叠加构图工艺的计量标记
展开▼
页面导航
摘要
著录项
相似文献
摘要
Cut spacer reference marks, targets having such cut spacer reference marks, and methods of making the same by forming spacer gratings around grating lines on a first layer, and fabricating a template mask that extends across and perpendicular to such spacer gratings. Cut spacer gratings are etched into a second layer using the template mask to superimpose at least a portion of the spacer gratings of the first layer into the second layer.
展开▼