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Metrology marks for unidirectional grating superposition patterning processes
Metrology marks for unidirectional grating superposition patterning processes
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机译:单向光栅叠加图案形成过程的计量标记
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摘要
Cut spacer reference marks, targets having such cut spacer reference marks, and methods of making the same by forming spacer gratings around grating lines on a first layer, and fabricating an angled template mask that extends across and resides at an angle with respect to such spacer gratings. Angled, cut spacer gratings are etched into a second layer using the angled template mask to superimpose at least a portion of the spacer gratings of the first layer into the second layer.
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