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SOLAR CELL DEVICE BASED ON STRAIN TYPE HETEROJUNCTION QUANTUM DOTS AND MANUFACTURING METHOD THEREOF

机译:基于应变型异质结量子点的太阳能电池装置及其制造方法

摘要

The present invention relates to the field of solar cell material. Provided are a solar cell device based on strain type heterojunction quantum dots and manufacturing method thereof. The solar cell device comprises at least two Ge/Si quantum dot structural layers grown on a doped silica-based substrate (1); the Ge/Si quantum dot structural layers comprise Si film layers (3) having Ge quantum dots (2) of 2-7 nm in diameter, the innermost Si film layer (3) being 2-4 nm, and increasing incrementally therefrom; the outermost quantum dot structural layer is SiO2 cover film layer (4) filling gaps between quantum dots, forming a multi-layer structure of quantum dot array filling film; a silicon doped layer protective film (5) of 10-20 nm in thickness is grown on the cover film layer (4); electrodes (7) are grown on the outer surfaces of the silicon doped layer (5) and the silica-based substrate (1). The energy band ranges from 0.4 eV to 0.22 eV and the corresponding conversion efficiency is 55%-57%, an increase of more than 7% compared to the prior art, significantly improving the photoelectric conversion efficiency of a solar cell.
机译:本发明涉及太阳能电池材料领域。提供一种基于应变型异质结量子点的太阳能电池装置及其制造方法。该太阳能电池装置包括至少两个生长在掺杂的二氧化硅基衬底(1)上的Ge / Si量子点结构层; Ge / Si量子点结构层包括直径为2-7nm的Ge量子点(2),最里面的Si膜层(3)为2-4nm并从此逐渐增加的Si膜层(3)。最外面的量子点结构层是填充量子点之间的间隙的SiO 2覆盖膜层(4),形成了量子点阵列填充膜的多层结构。在覆盖膜层(4)上生长厚度为10-20nm的硅掺杂层保护膜(5)。在硅掺杂层(5)和二氧化硅基衬底(1)的外表面上生长电极(7)。能带的范围为0.4eV至0.22eV,相应的转换效率为55%-57%,与现有技术相比增加了7%以上,大大提高了太阳能电池的光电转换效率。

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