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SUBSTRATE PROCESSING DEVICE, SUBSTRATE CONVEYANCE METHOD, PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

机译:基板处理装置,基板对流法,半导体装置的制造方法以及记录介质

摘要

Provided is a configuration comprising: a substrate holding tool holding a substrate; a detection unit that detects the placement state of the substrate held by the substrate holding tool; a first determination unit that compares detection data for the substrate, obtained by the detection unit, and master data serving as a reference and not obtained beforehand, and determines whether or not the detection data for the substrate is within a first permissible value; a confirmation unit that confirms the substrate type; a second determination unit that compares the detection data for the substrate and the master data and determines whether or not the detection data is within a second permissible value; and a conveyance control unit that controls the substrate holding tool in accordance with the determination results from the second determination unit, if, as a result of the determination by the first determination unit, a determination has been made that the detection data is outside the first permissible value and if the confirmation unit has confirmed that the substrate is a prescribed type.
机译:提供一种构造,其包括:保持衬底的衬底保持工具;以及支撑衬底的工具。检测单元检测由基板保持工具保持的基板的放置状态;第一确定单元,将由检测单元获得的基板的检测数据与事先未获得的,作为参考的主数据进行比较,并确定基板的检测数据是否在第一允许值内;确认单元,用于确认基板的种类;第二确定单元,其将基板的检测数据和主数据进行比较,并确定检测数据是否在第二允许值内;如果作为第一确定单元的确定结果,如果已经确定检测数据在第一外部,则输送控制单元根据第二确定单元的确定结果来控制基板保持工具。允许值,如果确认单元已确认基材为指定类型。

著录项

  • 公开/公告号WO2016017685A1

    专利类型

  • 公开/公告日2016-02-04

    原文格式PDF

  • 申请/专利权人 HITACHI KOKUSAI ELECTRIC INC.;

    申请/专利号WO2015JP71486

  • 发明设计人 KAWASAKI JUNICHI;ABIKO HAJIME;

    申请日2015-07-29

  • 分类号H01L21/677;H01L21/31;

  • 国家 WO

  • 入库时间 2022-08-21 14:19:09

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