首页> 外国专利> THIN-FILM TRANSISTOR, METHOD FOR MANUFACTURING THIN-FILM TRANSISTOR, AND LASER ANNEALING DEVICE

THIN-FILM TRANSISTOR, METHOD FOR MANUFACTURING THIN-FILM TRANSISTOR, AND LASER ANNEALING DEVICE

机译:薄膜晶体管,薄膜晶体管的制造方法以及激光退火装置

摘要

The present invention is a thin-film transistor provided with a gate electrode 1, a source electrode 3, a drain electrode 4, and a semiconductor layer 2 stacked on a substrate 5, wherein the semiconductor layer 2 is a polysilicon thin film 8, and the crystal grain size of the polysilicon thin film 8 in areas corresponding to the source electrode 3 and the drain electrode 4 is smaller than the crystal grain size of the polysilicon thin film 8 in a channel area 10 between the source electrode 3 and the drain electrode 4.
机译:本发明是一种薄膜晶体管,其具有层叠在基板5上的栅电极1,源电极3,漏电极4和半导体层2,其中,半导体层2是多晶硅薄膜8,以及在与源电极3和漏电极4对应的区域中的多晶硅薄膜8的晶粒尺寸小于在源电极3和漏电极之间的沟道区域10中的多晶硅薄膜8的晶粒尺寸。 4。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号