SOLUTION AND METHOD FOR REMOVAL OF GROUP III-V ELEMENT OXIDE, SOLUTION FOR TREATMENT OF GROUP III-V ELEMENT COMPOUND, SOLUTION FOR PREVENTING OXIDATION OF GROUP III-V ELEMENT, SOLUTION FOR TREATMENT OF SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCTION OF SEMICONDUCTOR SUBSTRATE PRODUCT

摘要

Provided are a solution for the removal of, a solution for preventing the oxidation of, and a solution for the treatment of a group III-V element oxide, each solution comprising an acid and a mercapto compound. Also provided is a method for using each of the solutions. Further provided are a solution for the treatment of a semiconductor substrate, the solution comprising an acid and a mercapto compound, and a method for the production of a semiconductor substrate product, the method using the solution.