ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK

摘要

(A) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by a specific general formula (I), and (B) a polymer compound having a structure in which a hydrogen atom of a phenolic hydroxyl group is substituted Contains compounds that generate acids by irradiation.