IMPRINT LITHOGRAPHY METHOD, METHOD FOR MANUFACTURING MASTER TEMPLATE FOR IMPRINT LITHOGRAPHY USING SAME, AND MASTER TEMPLATE MANUFACTURED THEREBY

摘要

An imprint lithography method comprises steps of: providing a base substrate containing a first area, a second area adjacent to the first area, a third area which is adjacent to a boundary of the first area and the second area and is a part of the second area, and a fourth area which is adjacent to the boundary and is a part of the first area; forming a first imprint pattern within the first and third areas on the base substrate; forming a first resist pattern covering the second area on the base substrate where the first imprint pattern is formed; etching a lower part of the first imprint pattern by having the first imprint pattern and the first resist pattern be an etching barrier; removing the first resist pattern; forming a second imprint pattern within the second and fourth areas on the base substrate; forming a second resist pattern covering the first area on the base substrate where the second imprint pattern is formed; etching a lower part of the second imprint pattern by having the second imprint pattern and the second resist pattern be an etching barrier; and removing the second resist pattern.;COPYRIGHT KIPO 2016