首页> 外国专利> SENSOR FOR FILM THICKNESS MONITORING DEVICE FILM THICKNESS MONITORING DEVICE PROVIDED WITH SAME AND METHOD FOR MANUFACTURING SENSOR FOR FILM THICKNESS MONITORING DEVICE

SENSOR FOR FILM THICKNESS MONITORING DEVICE FILM THICKNESS MONITORING DEVICE PROVIDED WITH SAME AND METHOD FOR MANUFACTURING SENSOR FOR FILM THICKNESS MONITORING DEVICE

机译:用于胶片厚度监测装置的传感器胶片厚度监测装置提供的膜厚度监测装置及其制造方法

摘要

Provided are a sensor for a film thickness monitoring apparatus and a film thickness monitoring apparatus using the same, which can realize a high precision deposition rate by improving the measurement accuracy of film thickness by a simple structure. In the quadrature coordinate system X-axis, Y-axis and Z-axis, which are quartz crystal axes, the quartz plate is rotated about the Z-axis about the Z-axis and rotated about the X-axis and the frequency deviation at the temperature of the quartz crystal at 10 to 170 ° C is ± An SC-Cut quartz crystal vibrator having? And? That is 20 ppm or less, and a sensor head having no cooling means for holding the quartz crystal and cooling the quartz crystal.
机译:提供了一种用于膜厚监测装置的传感器和使用该传感器的膜厚监测装置,其可以通过简单的结构通过提高膜厚的测量精度来实现高精度的沉积速率。在作为石英晶体轴的正交坐标系X轴,Y轴和Z轴中,石英板绕Z轴绕Z轴旋转并绕X轴旋转,并且频率偏差为石英晶体在10至170°C的温度为±。和?等于或小于20ppm,并且传感器头不具有用于保持石英晶体和冷却石英晶体的冷却装置。

著录项

  • 公开/公告号KR20160124170A

    专利类型

  • 公开/公告日2016-10-26

    原文格式PDF

  • 申请/专利权人 가부시키가이샤 알박;

    申请/专利号KR20167025509

  • 发明设计人 이토 아츠시;

    申请日2016-03-03

  • 分类号G01B21/08;C23C14/54;G01N5/02;

  • 国家 KR

  • 入库时间 2022-08-21 14:13:19

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