CMP CATALYST COMPOSITION FOR TUNGSTEN POLISHING SLURRY AND CMP SLURRY COMPOSITION COMPOSITION COMPRISING THE SAME

摘要

The present invention relates to a catalyst composition for tungsten polishing slurry, and to a chemical mechanical planarization (CMP) slurry composition including the same. According to one aspect of the present invention, the catalyst composition for tungsten polishing slurry includes a vanadium compound or a composite including the same. According to another aspect of the present invention, the CMP slurry composition includes: the catalyst composition for tungsten polishing slurry; a polishing particle; and an oxidizer.