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SEMICONDUCTOR DEVICE WITH TRIANGULAR STRUCTURE, INCLUDING A GATE ELECTRODE AND A CONTACT STRUCTURE FOR A DIODE FIELD

机译:具有三角形结构的半导体器件,包括门极电极和二极管场的接触结构

摘要

A semiconductor device (500) has trench structures (350) extending from a first surface (101) into a semiconductor body (100). The trench structures (350) each have a gate structure (150) and a contact structure (315) extending through the gate structure (150). Transistor mesas 170 are formed between the trench structures 350. Each transistor mesa (170) has a body zone (115) which forms a first pn junction (pn1) with a drift structure (120) and a second pn junction (pn2) with a source zone (110). Diode regions (116) each directly adjoin one of the contact structures (315) and form a third pn junction (pn3) with the drift structure (120).
机译:半导体器件(500)具有从第一表面(101)延伸到半导体本体(100)中的沟槽结构(350)。沟槽结构(350)分别具有栅极结构(150)和延伸穿过栅极结构(150)的接触结构(315)。晶体管台面170形成在沟槽结构350之间。每个晶体管台面(170)具有主体区(115),该主体区形成具有漂移结构(120)的第一pn结(pn1)和具有漂移结构的第二pn结(pn2)。源区(110)。每个二极管区(116)直接邻接接触结构(315)之一,并与漂移结构(120)形成第三pn结(pn3)。

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