首页> 外国专利> DUAL RESURF TRENCH FIELD PLATE IN VERTICAL MOSFET

DUAL RESURF TRENCH FIELD PLATE IN VERTICAL MOSFET

机译:垂直MOSFET中的双曲面沟槽场板

摘要

A semiconductor device contains a vertical MOS transistor with instances of a vertical RESURF trench on opposite sides of a vertical drift region. The vertical RESURF trench contains a dielectric trench liner on sidewalls, and a lower field plate and an upper field plate above the lower field plate. The dielectric trench liner between the lower field plate and the vertical drift region is thicker than between the upper field plate and the vertical drift region. A gate is disposed over the vertical drift region and is separate from the upper field plate. The upper field plate and the lower field plate are electrically coupled to a source electrode of the vertical MOS transistor.
机译:半导体器件包含垂直MOS晶体管,该垂直MOS晶体管在垂直漂移区的相对侧上具有垂直RESURF沟槽的实例。垂直RESURF沟槽在侧壁上包含电介质沟槽衬层,以及下部场板和下部场板上方的上部场板。下部场板和垂直漂移区之间的电介质沟槽衬层比上部场板和垂直漂移区之间的电介质沟槽衬层厚。栅极设置在垂直漂移区上方,并且与上场板分开。上场板和下场板电连接到垂直MOS晶体管的源电极。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号