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WAFER PROCESSED BODY, TEMPORARY BONDING MATERIAL FOR WAFER PROCESSING AND METHOD FOR PRODUCING THIN WAFER

机译:晶圆加工的身体,用于晶圆加工的临时粘合材料以及生产薄晶圆的方法

摘要

The present invention is a temporary adhesive material for a wafer processing, used for temporarily bonding a support and a wafer having a circuit-forming front surface and a back surface to be processed, containing a complex temporary adhesive material layer having a three-layered structure that includes a first temporary adhesive layer composed of a non-silicone thermoplastic resin layer (A) capable of releasably adhering to the front surface of the wafer, a second temporary adhesive layer composed of a thermosetting siloxane polymer layer (B) laminated on the first temporary adhesive layer, and a third temporary adhesive layer composed of a thermosetting siloxane-modified polymer layer (C) laminated on the second temporary adhesive layer and capable of releasably adhering to the support. There can be provided a wafer processing laminate and a temporary adhesive material for a wafer processing that facilitate temporary adhesion and separation, have excellent CVD resistance, and can increase productivity of thin wafers, and a method for manufacturing a thin wafer using the same.
机译:本发明是用于晶片加工的临时粘合材料,其用于临时粘合支撑体和具有要形成电路的正面和背面的晶片,该晶片包含具有三层结构的复合的临时粘合材料层。包括第一临时粘合剂层和第二临时粘合剂层,第一临时粘合剂层由能够可释放地粘附到晶片正面的非有机硅热塑性树脂层(A)构成,第二临时粘合剂层由热固性硅氧烷聚合物层(B)层压而成临时粘合剂层,和第三临时粘合剂层,该第三临时粘合剂层由层压在第二临时粘合剂层上并且能够可释放地粘附到载体上的热固性硅氧烷改性的聚合物层(C)组成。可以提供一种晶片加工层压板和一种用于晶片加工的临时粘合材料,其有助于暂时粘合和分离,具有优异的CVD耐受性,并且可以提高薄晶片的生产率,并且提供了使用该材料的制造薄晶片的方法。

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