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CONTROL METHOD OF WAFER TRANSPORT SECTION AND LOAD PORT IN EFEM

机译:有限元法中晶圆运输截面和负荷口的控制方法

摘要

PROBLEM TO BE SOLVED: To provide a control method of a wafer transport section and a load port in an EFEM capable of protecting a wafer surface against oxidation or pollution, by keeping a clean environment in a container.SOLUTION: A control method of a wafer transport section and a load port in an EFEM includes: a step of fixing a container to a placing table of the load port; a first purification step of connecting the bottom nozzles of the load port to a plurality of bottom holes formed in the bottom face of the container placed on the placing table while closing a main opening, and introducing purification gas into the container and discharging gas from the container via the bottom nozzles; a connection step of stopping the introduction of the purification gas from the bottom nozzles, and connecting the container and a wafer transport chamber airtightly by opening the main opening; and wafer transport step of transporting a wafer from the container to a processing chamber through the opened main opening and wafer transport chamber, and then transporting the wafer from the processing chamber to the container through the wafer transport chamber and the opened main opening.SELECTED DRAWING: Figure 5
机译:解决的问题:提供一种EFEM中的晶片传送部分和装载口的控制方法,该方法能够通过在容器中保持清洁的环境来保护晶片表面免受氧化或污染。解决方案:晶片的控制方法EFEM中的运输部分和装载端口包括:将容器固定到装载端口的放置台上的步骤;第一净化步骤是将装载口的底部喷嘴连接到形成于放置在放置台上的容器的底面上的多个底孔,同时关闭主开口,然后将净化气体引入容器并从容器中排出气体。通过底部喷嘴的容器;连接步骤是:停止从底部喷嘴引入净化气体,并通过打开主开口将容器与晶片传送室气密地连接。晶片运输步骤是通过打开的主开口和晶片运输室将晶片从容器运输到处理室,然后通过晶片运输室和打开的主开口将晶片从处理室运输到容器。 :图5

著录项

  • 公开/公告号JP2017108049A

    专利类型

  • 公开/公告日2017-06-15

    原文格式PDF

  • 申请/专利权人 TDK CORP;

    申请/专利号JP20150242040

  • 发明设计人 OKABE TSUTOMU;HORIBE HIDETOSHI;

    申请日2015-12-11

  • 分类号H01L21/677;

  • 国家 JP

  • 入库时间 2022-08-21 14:00:00

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