Impurity diffusion composition, semiconductor device manufacturing method using the same, and solar cell

摘要

An object of the present invention is to provide an impurity diffusion composition that enables excellent printability and uniform diffusion to a semiconductor substrate. It is another object of the present invention to provide an impurity diffusion composition that forms a film having a sufficient mask property with respect to another impurity diffusion composition after diffusion. In order to achieve the above object, the present invention has the following configuration. That is, (A) a wet gel having a size of 1 μm or more and 50 μm or less and (B) an impurity diffusion composition containing an impurity diffusion component.