Etching solution for multilayer film, etching concentrated solution, and etching method

摘要

In an etchant that etches a multilayer film of a copper layer and a molybdenum layer with a single solution, the cross-sectional shape of the edge after etching is deposited in the etchant with a geometrical requirement that there is no undercut and a forward taper. It is important that no product is generated when used in mass production. Etching solution for multilayer film containing hydrogen peroxide, inorganic acid, acidic organic acid, neutral organic acid, amine compound, copper layer containing hydrogen peroxide decomposition inhibitor and molybdenum layer contains azole compound Therefore, no reaction product is generated with hydrogen peroxide, and no precipitate is generated in the etching solution. In addition, the cross-sectional shape of the edge after etching can be a preferable forward tapered shape. Furthermore, since it does not contain phosphorus compounds or fluorine compounds, it has a light environmental impact during disposal.