首页>
外国专利>
Method of fabricating a uniformly aligned planar array of nanowires using atomic layer deposition
Method of fabricating a uniformly aligned planar array of nanowires using atomic layer deposition
展开▼
机译:使用原子层沉积制造均匀排列的纳米线平面阵列的方法
展开▼
页面导航
摘要
著录项
相似文献
摘要
Invention for producing an orderly aligned horizontally planar array of nanowires comprising:;step 1) providing a template for producing nanowires in which the template comprises an alternating multilayer stack of substrate and inert insulating thin film layers; and;step 2) fabricating an orderly aligned, horizontally planar array of nanowires by depositing atoms and/or molecules along the outer edges of the thin film substrate layers on at least one side of the template with the use of atomic layer deposition.
展开▼