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SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION FOR SHOT GENERATION
SUB-RESOLUTION ASSIST FEATURE IMPLEMENTATION FOR SHOT GENERATION
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机译:拍摄生成的子分辨率辅助功能实现
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摘要
A design layout for a semiconductor chip includes information on shapes desired to be fabricated. Clusters of photolithographic exposure “shots” are generated and subject to a measure of shot density to approximate a mask shape that generates the desired fabricated shapes when exposed during wafer fabrication. A simulation is run on the clusters of shots to estimate the resulting fabrication shapes that the clusters of shots create. The clusters of shots are modified to align the estimated fabrication shapes more closely with desired fabrication shapes. The process of simulating and modifying the shots is iterative, repeating until the estimated fabrication shapes are within a desired error difference of the planned fabrication shape.
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