首页> 外国专利> BICMOS device having commonly defined gate shield in an ED-CMOS transistor and base in a bipolar transistor

BICMOS device having commonly defined gate shield in an ED-CMOS transistor and base in a bipolar transistor

机译:BICMOS器件在ED-CMOS晶体管中具有共同定义的栅极屏蔽,在双极晶体管中具有基极

摘要

A MOSFET transistor in a SiGe BICMOS technology and resulting structure having a drain-gate feedback capacitance shield formed between a gate electrode and the drain region. The shield does not overlap the gate and thereby minimizes effect on the input capacitance of the transistor. The process does not require complex or costly processing since the shield is composed of bipolar base material commonly used in SiGe BICMOS technologies.
机译:一种采用SiGe BICMOS技术的MOSFET晶体管,其结构为在栅电极和漏区之间形成了漏栅反馈电容屏蔽。屏蔽层不与栅极重叠,从而使对晶体管输入电容的影响最小化。由于屏蔽层是由SiGe BICMOS技术中常用的双极性基材组成,因此该过程不需要复杂或昂贵的处理。

著录项

  • 公开/公告号US9633994B2

    专利类型

  • 公开/公告日2017-04-25

    原文格式PDF

  • 申请/专利权人 TEXAS INSTRUMENTS INCORPORATED;

    申请/专利号US201615050684

  • 发明设计人 JEFFREY A. BABCOCK;ALEXEI SADOVNIKOV;

    申请日2016-02-23

  • 分类号H01L27/06;H01L29/40;H01L29/78;H01L29/66;H01L21/8249;H01L29/423;H01L21/3213;H01L29/06;H01L29/45;H01L29/49;

  • 国家 US

  • 入库时间 2022-08-21 13:43:59

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