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Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films
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机译:用于低温化学气相沉积含碳氮化硅膜和碳氮氧化硅膜的含硅膜的组合物和方法
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摘要
Silicon precursors for forming silicon-containing films in the manufacture of semiconductor devices, such as films including silicon carbonitride, silicon oxycarbonitride, and silicon nitride (Si3N4), and a method of depositing the silicon precursors on substrates using low temperature (e.g., 550° C.) chemical vapor deposition processes, for fabrication of ULSI devices and device structures.
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机译:用于在半导体器件制造中形成含硅膜的硅前体,例如包括碳氮化硅,氧碳氮化硅和氮化硅(Si 3 Sub> N 4 Sub>)的膜,以及一种使用低温(例如,<550℃)化学气相沉积工艺在衬底上沉积硅前体的方法,用于制造ULSI器件和器件结构。
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