FAST AND HIGH-SPATIAL RESOLUTION WAVE ABERRATION IN-SITU DETECTION APPARATUS AND METHOD FOR LITHOGRAPHY MACHINE

摘要

A fast and high-spatial resolution wave aberration in-situ detection apparatus and method for a lithography machine. The detection apparatus comprises a light source (1) for generating a laser beam; and an illumination system (2), an object plane grating plate (3), a mask table (4) that can bear the object plane grating plate (3) and has a precise location capacity, a lithography machine projection objective (5), a wave aberration sensor (6) and a working table (7) that can bear the wave aberration sensor (6) and has the capacity of XYZ three-dimensional scanning and precise location capacity are sequentially arranged along a beam propagation direction. Using such detection apparatus to detect a wave aberration of a lithography machine projection objective in situ and in real time increases the speed and spatial resolution of wave aberration detection.