首页> 外国专利> EVAPORATION SOURCE CONSTRUCTION AND ARRAY FOR IMPROVING HOMOGENUITY OF DEPOSITION FILM

EVAPORATION SOURCE CONSTRUCTION AND ARRAY FOR IMPROVING HOMOGENUITY OF DEPOSITION FILM

机译:蒸发源构建和提高沉积膜均质性的阵列

摘要

A purpose of the present invention is to provide a new-type evaporation source composition and an arrangement method thereof able to deposit a host material and a doping material on a large-area substrate so as to be homogeneous. According to such a purpose, the present invention fills two linear evaporation sources with the same host material when depositing a thin film in which one type of host material and other one type of doping material are combined together, fills three point evaporation sources with a doping material, arranges the three point evaporation sources to be spaced apart, and arranges the two linear evaporation sources in a gap between the point evaporation sources, thus composing a group of evaporation sources arranged in order of the point/linear/point/linear/point evaporation source and thereby starting a deposition process.
机译:本发明的目的是提供一种新型的蒸发源组合物及其布置方法,其能够将主体材料和掺杂材料沉积在大面积基板上从而均匀。根据这样的目的,本发明在沉积其中一种类型的主体材料和另一种类型的掺杂材料结合在一起的薄膜时,本发明用相同的主体材料填充两个线性蒸发源,用掺杂物填充三点蒸发源。材料,将三个点蒸发源布置成间隔开,并将两个线性蒸发源布置在点蒸发源之间的间隙中,从而组成按点/线性/点/线性/点的顺序排列的一组蒸发源蒸发源,从而开始沉积过程。

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