COMPOSITION FOR FORMING RESIST UNDERCOAT METHOD FOR FORMING RESIST UNDERCOAT AND PATTERNING PROCESS

摘要

An object of the present invention is to provide a resist underlayer film material of a multilayer resist film used in lithography, which is excellent in step-gap filling property of a substrate, has solvent resistance and does not cause twisting during etching of a substrate, A composition for forming a resist lower layer film for forming a lower layer film, a method for forming a resist lower layer film using the same, and a pattern forming method are provided.(A) obtained by condensing at least a compound represented by the following formula (1) and a compound represented by the following formula (2) with an acid catalyst, a compound (B) represented by the following formula (1), a fullerene compound And a composition for forming a resist lower layer film. Formula (1) Formula 2 ;