POLARIZATION-INFLUENCING OPTICAL ARRANGEMENT IN PARTICULAR IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

The present invention relates in particular to a polarization-influencing optical arrangement of a microlithographic projection exposure apparatus. In one aspect of the present disclosure, the polarization-influencing optical arrangement comprises at least one first sub-element (111, 311, 411) consisting of an optically positive uniaxial crystalline material and at least one optically negative, A first delay element (110, 310, 410) comprising a second partial element (112, 312, 412); And at least one third partial element (121, 321, 421) composed of the optically positive short axis crystal material and at least one fourth partial element (122, 322, 422) composed of optically negative short axis crystal material Wherein at least one of the first delay elements (110, 310, 410) comprises a second delay element (120, 320, 420) The influence effect corresponds to the effect of the first lambda / 2 plate having the first fast axis of birefringence and the polarization effect of the second delay elements 120, 320 and 420 corresponds to the effect of the second lambda / Corresponds to the effect of the / 2 plate, and the angle between the first and second fast axes is 46 5 .;