DEVICE FOR RECEIVING DIRECTIONAL EXTREME ULTRAVIOLET RADIATION WITH WAVELENGTH OF 11,2 nm ±1 FOR HIGH-RESOLUTION PROJECTIVE LITHOGRAPHY

摘要

FIELD: physics.;SUBSTANCE: invention relates to a device for obtaining directional extreme ultraviolet radiation with a wavelength of 11.2 nm ±1% for high-resolution projective lithography. The device includes a gyrotron, a terahertz-range radiation generating beam, a system for introducing radiation into a vacuum chamber, a system of quasi-optical mirrors focusing radiation into the region of the inhomogeneous expanding xenon flux created by the gas puffing system at the supersonic expiration of xenon to the vacuum with a characteristic transverse dimension less than a millimetre in the focus of a multilayer X-ray mirror of normal incidence, which forms directional extreme ultraviolet radiation from the discharge emerging in the combined foci of the mirror system and the multilayer X-ray mirror. The gas puffing system is designed to mix xenon with another light gas. In addition, the gas puffing system can be built into the gas cooling and reducing unit, creating a narrowly directed flow of atoms and clusters of the xenon working substance with a size of 10-1000 angstroms upon the expiration of xenon.;EFFECT: increasing the life of the device.;3 cl 3 dwg