Projection exposure system with multifunctional pellicle and method for the production of the projection exposure system

摘要

The present invention relates to a projection exposure apparatus for microlithography with an illumination system and a projection lens system, wherein between the illuminating system and projection objective a reticle receptacle for the arrangement of a reticle is arranged and between the reticle receiving and the first optical element of the projection objective a pellicle for shielding against contamination of the reticle is arranged, which, from the working light of the projection exposure system in the region of a surface by means of radiation is radiated, wherein the pellicle comprises a foil, which, by means of the radiation surface with a defined manner in the direction of transmission is constructed of different thicknesses. The present invention also relates to a method for producing and / or maintenance of a projection exposure apparatus for microlithography.